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The law firm of Nixon Vanderhye (Washington D.C.) retained Hampton IP professionals, on behalf of the defendant, to provide an opinion of damages arising from the alleged infringement of U.S. Patent No. 4,924,257, titled Scan and Repeat High Resolution Lithography System; U.S. Patent No. 5,285,236, titled Large-Area High Throughput; U.S. Patent No. 5,291,240, titled Nonlinearity-Compensated Large-Area Patterning System; U.S. Patent No. 5,721,606, titled Large-Area High Throughput Scan and Repeat; and U.S. Patent No. 5,897,986, titled Projection Patterning of Large Substrates.
Hampton IP professionals provided an opinion on economic prejudices and patent misuse, and submitted a Rule 26 expert report.
Patent Damage
Anvik Corporation
Sharp Corporation, et al.
Scanner machines
Technology
Washington D.C.